为了研究衬底温度对硒化锌薄膜微观结构和光学特性的影响，采用电子束蒸发技术在K9玻璃基底上制备了单层的硒化锌薄膜。通过研究薄膜的X射线衍射谱、透射光谱特性、表面形貌及粗糙度，分析了不同衬底温度下薄膜微观晶体结构和光学特性的变化规律。实验结果表明：在20~200℃的衬底温度范围内制备的ZnSe薄膜均为具有（111）晶面择优取向的纳米晶薄膜，随着衬底温度升高，基片上原子获得的动能增加，导致薄膜的晶粒尺寸变大、内应力和位错密度降低；同样在不同衬底温度下，薄膜的光学特性也不尽相同，随着衬底温度的升高，折射率和消光系数减小、光学带隙增加、薄膜的表面粗糙度降低。分析表明折射率下降是薄膜中空隙部分所占比例增加所致，而消光系数的下降是薄膜结晶度提高，内部缺陷减少造成的。

The effect of thermal annealing on the optical properties, microstructure, and laser-induced damage threshold (LIDT) of HfO₂/Ta₂O₅/SiO₂ HR films has been investigated. The transmission spectra shift to a short wavelength and the X-ray diffraction peaks of monoclinic structure HfO₂ are enhanced after thermal annealing. The calculated results of the m( 111) diffraction peak show that the HfO₂ grain size is increased, which is conducive to increasing the thermal conductivity. Thermal annealing also reduces the laser absorption of high-reflection films. The improvement of thermal conductivity and the decrease of laser absorption both contribute to the improvement of LIDT. The experimental results show that the highest LIDT of 22.4 J/cm² is obtained at 300°C annealing temperature. With the further increase of annealing temperature, the damage changes from thermal stress damage to thermal explosion damage, resulting in the decrease of LIDT.